Welcome to the 2012 Fall Edition of the NanoMeter, page 3
Cornell NanoScale Facility Celebrates its Thirty-Fifth Anniversary!, page 4
Impact of Nanotechnology Heard Globally at Online Briefing, page 5
Nellie Yeh-Poh Lin Whetten Memorial Award: Samantha Roberts, page 8
New Technique Could Mean Super Thin, Strong Graphene-Based Circuits, page 10
Synthetic Blood Vessels Could Lead to Breakthroughs in Tissue Engineering, page 11
Cornell Staffers Skvarla and Glanville Recognized for Dedicated Service, page 14
New Staff Member: Saikat Mukhopadhyay, page 14
CNF Acquires the Latest in Microfluidic Testing Stations, page 15
Oxford PECVD System, page 16
ReynoldsTech Electroplating Stations, page 16
Nanonex NX-2500 Nanoimprint Lithography Update, page 17
The 2012 NNIN REU Program, page 18
NNIN to Hold ALD Symposium at Harvard University, page 19
All CNF Labs Closed December 15-January 28, page 19

The cover of the Fall NanoMeter was made with actual leaves collected on Cornell campus. The CNF's VersaLaser 3.50 was used to cut text in them (setting: 8% power, 10% speed, 500 pulses per inch, 0.6 mm Z-height), showing, once again, how cool this laser is. The VersaLaser 3.50 is a CO2 laser that emits in the infrared range with a spot size of 25 µm. Line art CAD designs can be translated into substrate to cut or etch patterns. Typical substrates include heat-resist?ant glass and fused silica wafers, polymers (including Delrin, polyimide and acrylic) and adhesive tapes. Line widths can be as narrow as 40-120 µm depending on the substrate, and through holes smaller than the spot size can be produced on the backside of thin substrates. Processing times are typically on the order of minutes! What would you like to cut or engrave? Contact Beth Rhoades for information and training. The fall leaves were arranged by Beth, and the actual photograph of the leaves was taken by Don Tennant, who also took this picture of Beth!