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CNF Short Course: Technology and Characterization at the Nanoscale Tuesday - Friday, June 3-6, 2008 : OVERVIEW : All lectures are held in 203 Phillips Hall. All Lab Sessions are in the CNF Clean Room, Duffield Hall. Pizza Party and lunches are held in the Upson Hall Lounge. The Pizza Party and lunch each day are included in the cost of the course.
The course comprises fabrication techniques needed to design process sequences for many devices. We will teach how to use them by means of three specific applications: microfluidics, cantilevers, and nanoelectrodes. Each day is dedicated to the fabrication of one of these applications. After the course, attendees will be able to design processes for their own applications.
If you have a preference for which lab groups you are assigned to, please note the day and group designation on your registration. We'll do our best to put participants in their preferred group.
5:15 pm, Registration, Welcome to CNF and the TCN, Pizza Party & Clean Room Orientation (Mandy, Mike, Edward, Garry, Beth)
8:00am Welcome & Introduction 8:05am - 9:00 am, Science at the Nanoscale, Introduction to NNIN and CNF (George Malliaras) 9:00-9:15 am, Break 9:15-9:30, Overview over TCN lectures, Introduction to the Fabrication of Microfluidic Systems (Mandy Esch, Beth Rhoades) 9:30-10:30, Introduction to Photolithography (Garry Bordonaro, or tentatively Edward Camacho) 10:45-12:30 pm, Hands-on Photolithography Lab: Mask Generation, Resist Application, Contact Photolithography
12:30-1:30 pm, Lunch 1:30-2:30 pm, Introduction to Pattern Transfer, Deep Reactive Ion Etching (Vince Genova) 2:45-4:30 pm, Lab Demonstrations: Optical Microscopy, Profilometry, Deep Reactive Ion Etching, Wafer Bonding, Molecular Vapor Deposition, PDMS Fabrication
8:00-8:10 am, Introduction to the Process Flow for Cantilever Fabrication (Mandy Esch) 8:10-9:15 am, Introduction to Thin Films, Thermal Oxidation, Chemical Vapor Deposition, Thin Film Characterization (Phil Infante) 9:15 - 9:30 am, Break 9:30 - 10:15 am, Photolithography II (Garry Bordonaro) 10:15-10:30 am, Break 10:30-11:15 pm, Reactive Ion Etching of Thin Films, Wet Etching, Wet and Dry Release (Meredith Metzler) 11:15-11:30 am, Break 11:30-12:15 pm, Scanning Electron Microscopy (Daron Westly) 12:15-1:15 pm, Lunch 1:15-4:30, Lab Demonstrations: Chemical Vapor Deposition, Thin Film Measurements, Projection Photolithography, Reactive Ion Etching, Scanning Electron Microscopy
8:00-8:10 am, Introduction to the Process Flow for the Fabrication of Nanoelectrodes 8:10-9:10 am, Electron Beam Lithography, Nano Imprint Lithography (Alan Bleier) 9:10-9:25pm, Break 9:25-10:15 am, Physical Vapor Deposition and Pattern Transfer via Lift Off (Jerry Drumheller) 10:15-10:30 am, Break 10:30-11:00 am, Atomic Force Microscopy (John Treichler) 11:00-11:30 am, Bottom Up Nanofabrication and other Fabrication Techniques (Mandy Esch) 11:30-11:45 am, Break 11:45-12:15 pm, Process Integration Considerations (Daniel Woodie) 12:15-1:15 pm, Lunch 1:15-4:20pm, Lab Demonstrations: Electron Beam Lithography, Evaporation, Lift Off, Sputtering, AFM, Process Integration
4:30 Wrap Up Return to June 2008 CNF TCN Back to Top |
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This material is based upon work supported by the National Science Foundation under Grant No. 0649215. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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