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CNF Short Course: Technology & Characterization at the Nanoscale (CNF TCN)

Sample Schedule

Overview:

  • Participants must honor the CNF cleanroom dress code every day of the short course
  • The Tuesday Evening Orientation and Pizza Party will be held in 340 Duffield Hall
  • All Lectures and lunches will be held in 340 Duffield Hall
  • All Lab Sessions are in the CNF cleanroom, Duffield Hall 1st Floor
  • The pizza party and lunches are included in the cost of the course

DAY ONE:

Welcome Reception


5:30pm           Pizza Party, Registration & Orientation


DAY TWO:

Microfluidic Systems Fabrication


9:00am

-

9:05am

Welcome & Introduction, Overview of TCN Lectures

 

9:05am

-

9:50am

Science at the Nanoscale, Introduction to NNIN and CNF

 

9:50am

-

10:05am

Break

 

10:05am

-

10:10am

Introduction to the Fabrication of Microfluidics

 

10:10am

-

10:55am

Introduction to Photolithography

 

11:00am

-

12:30pm

Hands-on Photolithography Lab:

Mask Generation, Resist Application, Contact Photolithography


Microfluidic Systems Fabrication


12:30pm

-

1:15pm

Lunch

 

1:15pm

-

2:00pm

Introduction to Pattern Transfer, Deep Reactive Ion Etching

 

2:00pm

-

2:10pm

Break

 

2:10pm

-

4:15pm

Lab Demonstrations:

Optical Microscopy, Profilometry, Deep Reactive Ion Etching, Wafer Bonding, Molecular Vapor Deposition, PDMS Fabrication



DAY THREE:

MEMS Cantilever Fabrication


9:00am

-

9:05am

Introduction to the Process Flow for Cantilever Fabrication

 

9:05am

-

9:45am

Introduction to Thin Films, Thermal Oxidation, Chemical Vapor Deposition, Thin Film Characterization

 

9:45am

-

10:00am

Break

 

10:00am

-

10:45am

Photolithography II

 

10:45am

-

10:55am

Break

 

10:55am

-

11:40am

Reactive Ion Etching, Wet Etching, Wet and Dry Release

 

11:40am

-

11:50am

Break

 

11:50am

-

12:35pm

Scanning Electron Microscopy

 

12:35pm

-

1:20pm

Lunch

 

1:20pm

-

4:05pm

Lab Demonstrations:

Chemical Vapor Deposition, Thin Film Measurements, Projection Photolithography, Reactive Ion Etching, Scanning Electron Microscopy


DAY FOUR:

Nanoelectrode Fabrication


9:00am

-

9:05am

Introduction to the Process Flow for the Fabrication of Nanoelectrodes

 

9:05am

-

9:50am

Electron Beam Lithography, Nano Imprint Lithography

 

9:50am

-

10:05am

Break

 

10:05am

-

10:50am

Physical Vapor Deposition, Pattern Transfer via Lift Off

 

11:00am

-

11:30am

Atomic Force Microscopy

 

11:30am

-

11:45am

Bottom Up Nanofabrication and Other Fabrication Techniques

 

11:45am

-

11:50am

Break

 

11:50am

-

12:30pm

Process Integration Considerations

 

12:30pm

-

1:20pm

Lunch

 

1:20pm

-

3:45pm

Lab Demonstrations:

E-Beam Lithography, Evaporation, Lift Off, Sputtering, AFM, Process Integration

 

Note the class size has a minimum of 15 participants and a maximum of 30 (because of the hands-on lab activities). Your spot is not guaranteed until your payment is received. If the course is being charged to a CNF or Cornell account, we will notify the PI or accounts representative of the account. If paying by check, please make the check out to "Cornell University" and write "CNF TCN" in the memo line. Credit cards and Cornell procurement cards are also accepted -- once you submit your registration, follow the appropriate links on the confirmation page. A waiting list will be maintained in case of cancellations.

Return to CNF Nanocourses



 
Questions on course content should be directed to:
Beth Rhoades
250 Duffield Hall, CNF
Cornell University
Ithaca, New York, 14853

[email]


Questions on logistics and registration should be directed to:

Rebecca Vliet
250 Duffield Hall, CNF
Cornell University
Ithaca, New York, 14853

[email]

 

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