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SPIE Handbook of Microlithography, Micromachining and Microfabrication

Volume 1: Microlithography

2.8 Acknowledgements


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2.8 Acknowledgements

The authors would like to thank the many people who helped in the editing, proofreading, and checking of this chapter; primarily the SPIE reviewer and copy editor, and including also Sylvia Chanak (Cadence), Dennis Costello (Cornell), Mark Gesley (Etec), George Lanzarotta (Raith), Alex Liddle (Lucent), Francois Marquis (Design Workshop), Beth Moseley (Hitachi), Joseph Nabity (Nabity Lithography Systems), Yasutoshi Nakagawa (JEOL), Hans Pfeiffer (IBM), Rainer Plontke (Leica Jena), John Poreda (Lepton), and Bernard Wallman (Leica).


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Previous section: 2.7 Resists
Next section: 2.9 Appendix: GDSII Stream Format

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