Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


Unique Nanofabrication and Microscopy Applications with Helium/Neon Ion Microscope and SEM-based EBL Instrumentation Seminar

by

  Dr. Soeren Eyhusen, Carl Zeiss Microscopy    

  Dr. Jason E. Sanabia, Raith Nanofabrication


Friday September 15, 2017
2:00 PM – 3:30 PM
254 Duffield Hall
(which will be well-stocked with cookies, coffee, and tea)


In his 1959 speech entitled “There’s Plenty of Room at the Bottom,” Richard Feynman stated that he saw no reason why we cannot write the entire Encyclopedia Britannica on the head of a pin.  He even suggested ways of accomplishing the task:  “We can reverse the lenses of the electron microscope.”  “A source of ions … could be focused to a very small spot.”  Today, such writing with electron beams and focused ion beams are ubiquitous nanofabrication processes that are critical for advancing nanoscale science and engineering.


Since ZEISS introduced the ORION ten years ago, there have been several important applications in helium ion microscopy, which we will survey here, including imaging of 2D materials with very high resolution and great surface sensitivity as well as imaging of insulating specimen without the need for conductive coating or variable pressure methods. However, it was not long after the ORION was introduced before this unique “source of ions” was being employed for writing in nanofabrication, yet another realization of Feynman’s vision.  We will also survey the unique sub-10nm nanofabrication applications that are enabled by the He-FIB, Ne-FIB, and Ga-FIB, including fabrication of plasmonic devices, nanopores for DNA sequencing applications, graphene patterning, and milling of high-aspect ratio trenches and structures into multilayer materials.


Whereas the helium ion microscope is relatively new, the scanning electron microscope has been around for five decades.  And it was just a few years after they introduced the first SEMs when Cambridge Instruments would “reverse the lenses of the electron microscope” and introduce the world to electron beam lithography (EBL).  Since then, there have been decades of advances of EBL instrumentation, including the SEM-based EBL instrumentation, such as the eLINE, that Raith provides.  What can happen when we now “reverse the lenses” of an EBL instrument?  In answer, we discuss CAD-based navigation with CAD/SEM overlay, automated SEM inspection and CD-SEM metrology of device structures over large areas for nanofabrication process control, and large area SEM image stitching for reverse engineering of ICs and neuronal tissue.

This seminar is free, but RSVP ASAP so that we can plan accordingly and order enough coffee and snacks!
EMAIL jason.sanabia AT raithamerica.com and or rainer.schmid AT raithamerica.com


Information for Travelers, http://www.cnf.cornell.edu/cnf5_infotraveller.html
Return to CNF Annual Meeting, http://www.cnf.cornell.edu/cnf_2017am.html




Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNCINSF