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The CNF has several locations for doing wet chemical etching of substrates.  In addition to general chemistry hoods for using various acid and alkaline solutions we also have two tanks located in the furnace area for doing Nanostrip cleaning and Hot Phosphoric etching of silicon nitride.
The CNF supplies various premixed solutions for etching of various metals.  Below is information on the etch rates measured for the various materials as well as the recommended operating conditions.

Chemical Etchrates 



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Cornell University
NYSTARNNINNSF

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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