CNF - Wet Chemical Etching

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The CNF has several locations for doing wet chemical etching of substrates. In addition to general chemistry hoods for using various acid and alkaline solutions we also have two tanks located in the furnace area for doing Nanostrip cleaning and Hot Phosphoric etching of silicon nitride.

The CNF supplies various premixed solutions for etching of various metals. Below is information on the etch rates measured for the various materials as well as the recommended operating conditions.

Chemical Etchrates

Cornell University

NYSTAR

NNIN

NSF

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu