2015 NNIN REU Convocation Expectations [pdf]
· YOUR CONVOCATION PRESENTATION ABSTRACT is DUE to MELANIE-CLAIRE by 12 NOON on THURSDAY, JULY 30th.
· ONCE YOU HAVE SUBMITTED YOUR ABSTRACT, DO NOT CHANGE THE TITLE OF YOUR PRESENTATION AS IT WILL BE LISTED ONLINE, ON THE SCHEDULE, AND IN THE PROCEEDINGS BY THE SUBMITTED TITLE!
· See the abstract submission rules below…
Dear NNIN REU Interns:
Thank you for participating in our program! In a few short weeks, you'll be attending the network-wide convocation. In order for the convocation to be a positive experience for everyone involved — staff and student alike — please read and follow these expectations:
1. Attendance at the convocation is a mandatory part of the NNIN REU Program. Come to each session well rested and prepared to involve yourself in the presentations, poster session, and other activities.
2. The presentation sessions are professional technical meetings. Respectful and appropriate attire is expected every day, i.e., t-shirts and shorts are NOT appropriate. "Business Casual" = dress slacks and dress shirts or blouses, dresses or dress skirts, and appropriate footwear. Suit jackets and ties are optional. (After the presentations end each day, there will be time to change into comfortable clothes, if appropriate, for the evening events.)
3. Each site has different abilities / activities in their labs and on campus. Some are at a different stage of their program. Therefore, it behooves us to listen to each report with an open mind, resisting the tendency to compare.
4. If applicable: It is CRITICAL that you save SEM and AFM images at the HIGHEST RESOLUTION possible! Then use those high rez images! High contrast too!
5. Each intern will have TWELVE minutes TOTAL to present and take questions; Make sure you can give your report in eight or nine minutes, which then gives you three or four minutes for initial set-up and for questions at the end. (Practicing your presentation with your site group is critical! Ask you site coordinator to set that up, if they haven't already.) Keep in mind that your audience is primarily other NNIN REU interns who may have never heard of your “brand” of research, so avoid acronyms and research-specific jargon. At the same time, lots of interns have followed basic processes — like spinning resist and getting rid of it — so keep these steps to one or two slides. Spend your time talking about your results, good or bad!
6. There will be a Community Poster Session. The Poster Session will be long enough for you to answer questions on your work and also look at other posters. Poster specifics are on the REU convocation web site at . Please bring your completed poster to the convocation site (or better yet, have your site coordinator FedEx them to the host).
7. IMPORTANT 1: Your PRINCIPAL INVESTIGATOR or Mentor MUST proofread and approve your presentation and poster!! We will be video-taping and live web-casting the convocation. So it is critical that your presentation and poster be correct and accurate accountings of your research —for which you have permission from your PI for public viewing and web archiving!
8. IMPORTANT 2: Bring a complete PowerPoint presentation to the convocation. We will preload presentations the first night during the Pizza Party.NO changes can be made after that! Please name your presentation whatever naming format LYNN RATHBUN requests.
9. IMPORTANT 3: BRING TWO COPIES of your presentation! If one gets corrupted (or lost) in travel, perhaps the other one will work. Presentations have not occurred because an intern only brought one copy and that one didn't work! Your site coordinator may collect your presentations for easier uploading during the Pizza Party, BUT BRING YOUR OWN COPY TOO, and AGAIN, do not change your presentation or your title!
10. IMPORTANT 4: Your presentation and poster must have both the NNIN and NSF logos in/on them. Download those at
11. IMPORTANT 5: Scientific talks are a form of dialogue. Therefore, view your talk and poster presentation as a way to get helpful feedback on your project, and also sharpen your approach to research in general. Don't miss out on the benefit of the expertise of your audience!
12. If your parents or friends are interested, they are welcome to attend the convocation. You must let us know to expect them. Email Melanie-Claire [email]. We will need to know full names, email addresses, and intended dates of participation.
13. If you have any dietary restrictions, please inform Melanie-Claire [email] immediately.
14. Email your presentation abstract* to Ms.
Melanie-Claire Mallison by 12 NOON on THURSDAY, JULY 30th. Your abstract is meant to be a very simple, straight-forward
summary of what you are doing and why. (See the sample below.) It should not
contain diagrams, complicated formulas or excessive symbols. At the same time,
your abstract should reflect what makes your research different. It is critical
that your PI or mentor proof-reads and approves of your abstract! Please email
the abstract as a Word attachment to Melanie-Claire with “Your Last Name’s Convocation Abstract” as the email subject. Name
the file "YourlastnameREUsiteInitialsAbstract.doc"
NNIN REU SITE ABBREVIATIONS:
* IMPORTANT ABSTRACT DISTINCTION to NOTE: Your presentation abstract is not the same as your project abstract. Your presentation abstract is the summary of what you are presenting at the convocation. Your project abstract is the summary of your completed work as presented in your final written report, and that is not due until September!
NNIN REU Convocation Abstract Rules
VERY IMPORTANT #1: Your PRINCIPAL INVESTIGATOR or mentor MUST approve your abstract.
VERY IMPORTANT #2: Your abstract title MUST match your presentation title!
VERY IMPORTANT #3: The Email Subject Line MUST read: " Your Last Name’s Convocation Abstract" I.e., Mallison’s Convocation Abstract
VERY IMPORTANT #4: Send the abstract by 12 NOON on THURSDAY, JULY 30th as an attached Word file named YourlastnameREUsiteinitialsAbstract.doc (or .docx), i.e., MallisonCNFabstract.doc
(See http://www.nnin.org/reu/final-report-rules for the correct REU Site Initials!)
Your abstract must include the following information FIRST:
PLEASE DO NOT ABBREVIATE ANYTHING IN THIS SECTION! SPELL OUT “ENGINEERING” ETC!
1. REU Presentation Abstract Title (MUST MATCH YOUR ACTUAL PRESENTATION TITLE):
2. REU Intern, Major, Home Institution:
3. REU Principal Investigator, Department, Institution: (Full Name, I.E. "Robert" Not "Bob")
4. REU Mentor, Department, Institution: (Full Name, I.E. "Katherine" Not "Kathy")
5. Email Addresses for INTERN, PRINCIPAL INVESTIGATOR and MENTOR: (In that order)
* Text of Abstract * 200 WORDS ONLY, including any references if used, but not including the header info above.
Again, please read these expectations carefully and follow them!
Abstracts are due BY NOON ON THURSDAY, JULY 30th! Thank you!!
SAMPLE ABSTRACT FOR CONVOCATION PROCEEDINGS:
Fabrication of Sub-Micron Spin-Dependent Tunneling Junctions using Electron-Beam Lithography
Ashish Ahuja, Applied Physics, Columbia University
NNIN REU Principal Investigator: Manish Sharma, Electrical Engineering, Stanford University
NNIN REU Mentor: Shan X. Wang, Materials Science, and Electrical Engineering, Stanford University
Contact: email@example.com, firstname.lastname@example.org
The Spin Dependent Tunneling (SDT) effect provides a way of making non-volatile magnetic memory. In an SDT device, the mode of electron transport is by quantum-mechanical tunneling across a thin dielectric barrier. Due to a ferromagnet-dielectric-ferromagnet architecture, the tunneling current is polarized in spin, and consequently magnetoresistive effects are observed. The focus of this project is to fabricate submicron SDT's so that we can (a) study their switching properties and (b) observe the area-dependence of the MR effect to explore the possibility of memories with high-densities. A bilayer photoresist process compatible with e-beam patterning was developed in the first part of this project. The junction features desired essentially require the presence of sufficient undercut in the bottom resist layer. We have used PMGI and SNR200 deep-UV photoresists to achieve this bilayered structure. Resist features as small as 0.2 µm in size and with a sufficient undercut have been achieved. Currently, actual SDT junctions are being fabricated using this process.
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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