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Introductory Training
& Application Support


RSVP by Monday, September 24th


BEAMER Beginner's Training & Advanced Application Workshop: Understanding Data Preparation

Tuesday, October 2, 2018
254 Duffield Hall
9:30 AM - 12:00 PM
1:00 PM - 4:30 PM


The goal of this training course is to allow attendees to become familiar with the BEAMER interface and controls to optimize their e-beam lithography. At the end of the training session, the user should be able to create their own flows, inspect/prepare their data and import/export their layout to the machine format. Users of BEAMER who are familiar with these topics are not required to attend, but many may benefit by adding to their basic skill set.

Topics to be covered:

  • Quick Overview Base Module Fundamentals (Import, Export, Bias, Heal, Extract, etc.)
  • VIEWER Basics
  • Export Module
  • Field Control Options
  • Multipass
  • Fracturing Modes
  • Proximity Effect Correction

After the training session, we will use the remainder of the day for an applications workshop. This is your opportunity to bring your patterns, process and experimental data for in-person support from GenISys representatives. Please feel free to bring any data you are interested in optimizing for exposure.


[1] It is strongly suggested to bring a Windows compatible computer and wheeled mouse. User will be provided a temporary BEAMER license for the day plus demo flows and patterns for various exercises. After the session the user won’t have use of the license but will still have the use of the manual, videos, demo flows and patterns. For the applications session, please bring any relevant pattern and process data, including the chosen material stack.

[2] RSVP by Monday, September 24th.

Roger McCay, Sales Director North America
GenISys, Inc.
Cell: +1 812-322-4554
Phone: +1 408-353-3951
Web: www.genisys-gmbh.com


Information for Travelers, http://www.cnf.cornell.edu/cnf5_infotraveller.html
Return to CNF Annual Meeting, http://www.cnf.cornell.edu/cnf_2018am.html

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