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Beginner's and Advanced Trainings

254 Duffield Hall
Cornell University, Ithaca NY 14853

Wednesday, September 13, 2017


GenISys is offering a one-day workshop on Wednesday, September 13th. Each section of the workshop is limited to 20 participants, because of the hands-on components. The workshop is free, but RSVP by Monday, September 11th, so that we can plan accordingly and order enough coffee and snacks! PLEASE SEE the request to also contact Roger McCay directly regarding the afternoon section of the workshop.  Thank you!

**** Please bring your Windows compatible laptop with a wheeled mouse for more hands on training



BEAMER Beginner's Training: Understanding Data Preparation and PEC

9:30 a.m. - 12 Noon, 254 Duffield Hall


The goal of this training course is to allow attendees to become familiar with the BEAMER interface and controls to optimize their e-beam lithography. At the end of the training session, the user should be able to create their own flows, inspect/prepare their data and import/export their layout to the JEOL machine format. Users of BEAMER who are familiar with these topics are not required to attend.

Topics to be covered:

Quick Overview Base Module Fundamentals (Import, Export, Bias, Heal, Extract, etc.)

Export Module:

  • Field Position Control
  • Fracturing Modes
  • Layout VIEWER Basics
  • Proximity Effect Correction


Advanced BEAMER/LAB Training 

1:30 p.m. - 4:30 p.m., 254 Duffield Hall 


Advanced individual or group BEAMER or LAB training is offered to users of the JEOL E-Beam Lithography systems. This is your chance to work directly with the GenISys Application Engineer to understand how to optimize your litho for your specific project(s). In particular, if your patterns from the JEOL EBL tools suffer from field stitching, poor line-edge (or line-width) roughness, critical dimension non-uniformity, limited process latitude, etc., you should schedule an appointment to understand how to mitigate these issues. Limited availability. Highly recommended for individual staff and/or research groups. Please coordinate with your research team to schedule a small group training (5 people or less).

Requests for appointment should be made to Roger McCay [email] no later than 5:00 p.m., Monday, September 11. Your request MUST include:

  • Desired appointment time
  • EBL Patterns
  • The material stack from top to bottom including the resist layer and thickness of each layer. For example, material stack information would look similar to the following:
  • 100 nm PMMA
  • 2 um Si
  • 1 um SiO2
  • 500 um Si
  • Purpose of the pattern/project


Information for Travelers, http://www.cnf.cornell.edu/cnf5_infotraveller.html
Return to CNF Annual Meeting, http://www.cnf.cornell.edu/cnf_2017am.html

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