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CNF Lab and Equipment Information
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Full Equipment List
PHOTOLITHOGRAPHY
Equipment for mask making, resist coating, exposing, developing, UV curing and stripping your substrates.
FURNACE PROCESSING
Furnaces for growing silicon oxide and depositing polysilicon, silicon nitride, and silicon oxide as well as processes for cleaning the wafers before deposition.
COMPUTING
Computing resources for computer aided design (CAD), simulation, and analysis.
ELECTRON-BEAM LITHOGRAPHY
Tools for coating, exposing, and developing wafers utilizing advanced electron beam lithography for minimum feature sizes.
ELECTRICAL TESTING
Metrology equipment for electrically testing semiconductor devices.
METROLOGY
Equipment for measuring various aspects of your substrates both during and after your fabrication.
SEMS / MICROSCOPES
Scanning electron microscopes, optical microscopes, and other imaging tools for examining your nanoscale devices.
ETCHING
Dry etching systems for transferring your nanoscale patterns into your substrates.
THIN FILM DEPOSITION
Tools for depositing insulating, semiconducting, and metallic films on your substrates.
PACKAGING & MISC PROCESSING
Tools for packaging of devices as well as other miscellaneous processing tools.
FACILITIES
Chemical hoods, building systems, and other parts of the laboratory infrastructure.
Full Equipment List Back to Top |
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2013 CNF Technical Reports Due June 12th
May 09, 2013 CNF USERS: It is time once again to plan for the Cornell NanoScale Facility Research Accomplishments. As you may recall, one of the requirements of using the CNF for your research is the submission of an annual technical report. It is extremely important that we receive complete and interesting reports from all users and all projects. Full text and instructions.....
Upgrade to Java 7u25
Jun 18, 2013 Oracle has released Java 7u25 . This release fixes aporoximately 40 vulnerabilities, many of which are remotely exploitable. CNF recommends disabling the Java web-browser plug-in. CNF Coral only uses Java Web-Start and not the Java web browser plug-in. More Info...
Oxford Plasma Processing Seminar
Jun 06, 2013 The Cornell NanoScale Facility (CNF) and Oxford Instuments are hosting a Plasma Processing Seminar on Cornell campus. The seminar will address the latest research and technologies in plasma etch deposition and growth, and will include presentations, discussions, a poster session focusing on latest innovations, and a networking lunch. Please register by Monday, August 12th. Thank you! Information and registration 
COMPUTING ELECTRICAL TESTING ELECTRON-BEAM LITHOGRAPHY ETCHING FACILITIES FURNACE PROCESSING METROLOGY PACKAGING & MISC PROCESSING PHOTOLITHOGRAPHY SEMS / MICROSCOPES THIN FILM DEPOSITION |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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