COMPUTING CATS Pattern Conversion and Proximity Correction Suite Computer Workstations Coral SeaBird Design Workshop File Transfer Share for Tools GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction Intel Computing Cluster JGDS2 - Java GDS Library L-Edit CAD Software LinkCAD pattern preparation software Litho Resources Mobile CNFUsers Site PROLITH by KLA-Tencor ELECTRICAL TESTING CV Testing Station IV Probe Station ELECTRON-BEAM LITHOGRAPHY Electron beam Resist Spinners JEOL 6300 JEOL 9300 JEOL 9500 ETCHING Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher FACILITIES Chemical Hoods Toxic Gas System FURNACE PROCESSING Boron Doping - D1 Carbon Nanotube/Graphene Furnace CMOS N+ Polysilicon - D3 CMOS Wet Oxide - E2 General Material Anneal 1 - A1 LPCVD CMOS Nitride - E4 LPCVD LTO - B3 LPCVD Nitride - B4 MOS Clean MOS Clean Anneal 2 - B1 MOS Metal Anneal 3 - C1 MOS Metal Anneal 4 - C2 N+/P+ Polysilicon - C4 Phosphorus Doping - D2 TFT LPCVD LTO410 - A3 TFT Polysilicon - A4 TFT Wet/Dry Oxide - A2 Wet/Dry Oxide - B2 METROLOGY CDE ResMap Resistivity 4-pt Probe FilMetrics Film Measurement Systems FleXus Film Stress Measurement Leitz Film Measurement P10 Profilometer Soft Materials 4-point Probe VCA Optima Contact Angle Woollam Spectroscopic Ellipsometer Zygo Optical Profilometer PACKAGING & MISC PROCESSING Chemical Mechanical Polishing CMP - 6EC CorSolutions Microfluidic Probe Station Critical Point Dryer Dicing Saw - KS 7100 Dimatix Printer Hamatech Post CMP Brushcleaner Hot Press Ion Implant - Eaton KS Bonder Microdrill MVD100 PDMS Casting Station Rapid Thermal Processer - AG8108 RTA - AG610 Suss SB8e Substrate Bonder Versalaser Cutting/Engraving Tool Wire Bonder PHOTOLITHOGRAPHY 5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven SEMS / MICROSCOPES AFM - DI3100 AFM - Veeco Icon BX51 Fluorescence Microscope Focused Ion Beam - Hitachi FB-2000A Hitachi S-900 Nikon Eclipse L200N and Other Optical Inspection Microscopes Nikon Microscope Cameras Olympus Confocal Microscope SEM Sample Prep Sputtering System Zeiss Supra SEM Zeiss Ultra SEM Zyvex Nanoprobes for Ultra SEM THIN FILM DEPOSITION 1. SC4500 Odd-Hour Evaporator 2. SC4500 Even-Hour Evaporator AJA Sputter Deposition CHA Evaporator CVC Sputter Deposition Electroplating Tanks GSI PECVD Oxford ALD FlexAL Oxford PECVD Parylene Deposition PVD75 Sputter Deposition ReynoldsTech Conductive Polymer Vapor Deposition Tool Back to Top

	This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX