COMPUTING CATS Pattern Conversion and Proximity Correction Suite Computer Workstations Design Workshop GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction Intel Computing Cluster L-Edit CAD Software LinkCAD pattern preparation software PROLITH v.11 ELECTRICAL TESTING CV Testing Station IV Probe Station ELECTRON-BEAM LITHOGRAPHY Electron beam Resist Spinners JEOL 9300 Leica VB6 ETCHING Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher FACILITIES Chemical Hoods Toxic Gas System FURNACE PROCESSING Boron Doping - D1 CMOS N+ Polysilicon - D3 CMOS Wet Oxide - E2 General Material Anneal 1 - A1 LPCVD CMOS Nitride - E4 LPCVD LTO - B3 LPCVD Nitride - B4 MOS Clean MOS Clean Anneal 2 - B1 MOS Metal Anneal 3 - C1 MOS Metal Anneal 4 - C2 N+/P+ Polysilicon - C4 Phosphorus Doping - D2 TFT LPCVD LTO410 - A3 TFT Polysilicon - A4 TFT Wet/Dry Oxide - A2 Wet/Dry Oxide - B2 METROLOGY CDE ResMap Resistivity 4-pt Probe FilMetrics Film Measurement Systems FleXus Film Stress Measurement Leitz Film Measurement P10 Profilometer Rudolph AutoEL IV Ellipsometers VCA Optima Contact Angle Woollam Spectroscopic Ellipsometer WYKO Optical Profilometer PACKAGING & MISC PROCESSING Chemical Mechanical Polishing CMP - 6EC Critical Point Dryer Dimatix Printer Hamatech Post CMP Brushcleaner Ion Implant - Eaton K&S 7100 Dicing Saw K&S Thermosonic Gold ball bonder Microdrill MVD100 PDMS Casting Station Rapid Thermal Processer - AG8108 RTA - AG610 Suss SB8e Substrate Bonder Wire Bonder PHOTOLITHOGRAPHY 5X g-line Stepper ABM Contact Aligner Autostep i-line Stepper Brewer Automatic Resist Coat EV620 Contact Aligner Fusion UV Cure Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer HTG Contact Aligner JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven SEMS / MICROSCOPES AFM - DI3100 Focused Ion Beam - FEI 611 Nikon Microscope Cameras Olympus Confocal Microscope Olympus Fluorescence Microscope and Image Analysis System Optical Inspection Microscopes SEM Sample Prep Sputtering System Zeiss Supra SEM Zeiss Ultra SEM Zyvex S-100 Nanoprobes THIN FILM DEPOSITION ALD - Oxford FlexAL CHA Evaporator CVC Sputter Deposition Electroplating Tanks GSI PECVD IPE PECVD Parylene Deposition ReynoldsTech Conductive Polymer Vapor Deposition Tool SC4500 Even-Hour Evaporator SC4500 Odd-Hour Evaporator Back to Top

	This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX