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JBA 1000 Photoresist UV Cure

Tool for UV Curing of photoresist

Manager: Garry J. Bordonaro

Description:

The JBA 1000 is a DUV exposure system intended for curing photoresist before hardbake. The gridlamp has ~15mW/cm2 output at 250nm. This energy will cause photoresist to crosslink at the surface, thus preventing resist flow at elevated temperatures required for hardbaking.

Capabilities:

Processes Available:

Applications:




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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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