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MVD100
Molecular Vapor Deposition Tool for Surface Modification
Manager: Christopher Alpha
Backup: Michael Skvarla
Description:The large surface-area-to-volume ratios of surface and bulk micromachined micro and nanomechanical structures can cause unintentional adhesion of device components, referred to as stiction. Stiction occurs when restoring forces are unable to overcome interfacial forces such as capillary, van der Waals and electrostatic attractions. This results in permanent adhesion of device components to undesired surfaces. Consequently, anti-stiction coatings for micro and nanoelectromechanical systems (MEMS and NEMS, respectively) and information technology devices (e.g. hard disk storage media) have found wide spread use. Capabilities:
In the current tool configuration, only two precursors are available at the tool. Changing a precursor requires several hours work and therefore is only available by several days advanced notice. The currently loaded precursors and change schedule is as listed below: Processes Available:As of May 17th 2013; sources are: Additional Resources:MVD 100 Operating ManualResults:
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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