Heidelberg Mask Writer DWL66FS
DWL66FS Laser Pattern Generator and Direct Write System
Manager: Garry BordonaroBackup: John Treichler
The DWL 66FS is a high-resolution imaging system where over a million dpi is achieved using a 25-nanometer writeable address grid for exposing metallized plates or wafers. The DWL 66FS will accommodate media up to 6 x 6 inches. Design data can be created with any program using DXF, HPGL, Gerber, GDSII, or CIF format and is converted into a LIC format on a “CONVERT“ workstation. Design data transfer to the system is then realized via an FTP connection.
Additional Resources:DWL66FS Data Conversion Manual
DWL66FS User Manual 1
DWL66FS User Manual 2
Back to Top
This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact email@example.com for assistance.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: firstname.lastname@example.org
Powered by ITX