Heidelberg Mask Writer DWL66FS
DWL66FS Laser Pattern Generator and Direct Write System
Manager: Garry BordonaroBackup: John Treichler
The DWL 66FS is a high-resolution imaging system where over a million dpi is achieved using a 25-nanometer writeable address grid for exposing metallized plates or wafers. The DWL 66FS will accommodate media up to 6 x 6 inches. Design data can be created with any program using DXF, HPGL, Gerber, GDSII, or CIF format and is converted into a LIC format on a “CONVERT“ workstation. Design data transfer to the system is then realized via an FTP connection.
Additional Resources:DWL66FS Data Conversion Manual
DWL66FS User Manual 1
DWL66FS User Manual 2
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
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