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Chemical Hoods

Acid / Base Fume Hoods for General Wet Chemistry Steps

General Chemistry Hood
Manager: Dan Woodie
Backup: Sam Wright

Description:

The CNF has a variety of fume hoods for wet processing of samples. Hoods are available for acid and base/solvent processing. Spin Rinse Dryers (SRD) are available at most hoods for drying wafers after processing.

Measurements of the etch rates for common etchants is available below.

Processes Available:

  • DI Water
  • N2 blow off guns
  • Spin Rinse Dryers
  • Hotplates with Teflon thermocouples for closed-loop temperature control


Additional Resources:

Chemical Etchant Datasheets


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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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