Equipment for nanoimprint lithography

Description:

The EV520HE semi-automated hot embossing system is designed for embossing and nanoimprinting applications. This system accepts substrates up to 4" and is compatible with standard semiconductor manufacturing technologies. The hot embossing system is configured with a universal embossing chamber, high-vacuum and high-contact force capabilities (up to 40kN) and manages the whole range of polymers suitable for hot embossing.

Capabilities:

• Software controllable contact force
• Wafer sizes up to 4”
• Double-side heating up to 500°C
• Vacuum

Processes Available:

• Hot embossing into bulk plastics such as Zeonor, polycarbonate, polystyrene, as well as nanoimprint lithography on thin films
• Special nanoimprint resists developed by Nanonex
• Resist bonding

Applications:

µTAS, microfluidics (micromixers, microreactors), microoptics (wave guides, switches)