CNF - Lab and Equipment Information

CNF Lab and Equipment Information

Schedule Training ¦

Veeco Ion Mill

CAC Name: VEECO

Ion milling system for physical sputter etching of substrates

Manager: Jerry Drumheller

Equipment Training
Training takes about 1 1/2 hours. Contact: drumheller@cnf.cornell.edu to arrange for training..

Description:

The vacuum system is Cryo pumped, and equiped with a water cooled substrate stage which can tilt up to 90 degrees, and rotate the wafer. A 10 cm Kaufman Argon Ion beam source is used to sputter etch substrates up to 4 inch diameter. Small pieces are also easily used. Patterned etching can be done with hard masks, or very carefully with a photoresist mask. Relative removal rates for different materials are generally proportional to published sputter yield rates.

Additional Resources:

Equipment Information Sheet

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PlasmaTherm service visits
May 03, 2013
PlasmaTherm will have a service engineer on site to perform service on the etch tools. Here is the schedule when the tools will be unavailable:

Week of May 6: PlasmaTherm VLN DRIE - ongoing issue
Week of May 13: PT770
Week of May 20: PT770 & PT720/740

Scheduled updated 4/30 due to delays.

Please plan accordingly.

Notice Archive

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu