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CNF Lab and Equipment Information
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ASML 300C DUV Stepper
CAC Name: ASML ASML PAS 5500/300C DUV Stepper 
Manager: Garry Bordonaro
Backup: John Treichler
Equipment Training
Training currently consists of working one-on-one with users on their project. Contact the staff to arrange a project. Description:This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with a variable field size up to 21mm square. Minimum feature size is <0.20µm. The number and placement of the dies is programmable. Wafer size of 3" up to 200mm can be accommodated, as well as smaller pieces. Registered alignment is typically <0.045µm. 6" x 0.250"-thick quartz masks are used. Capabilities:
Additional Resources:Equipment Information SheetResults:
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PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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