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CNF Lab and Equipment Information
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ASML 300C DUV Stepper


ASML PAS 5500/300C DUV Stepper

ASML PAS 5500/300C Stepper Backup: John Treichler
Equipment Training
Training currently consists of working one-on-one with users on their project. Contact the staff to arrange a project.


This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with a variable field size up to 21mm square. Minimum feature size is <0.20µm. The number and placement of the dies is programmable. Wafer size of 3" up to 200mm can be accommodated, as well as smaller pieces. Registered alignment is typically <0.045µm. 6" x 0.250"-thick quartz masks are used.


  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.63 - 0.40 Variable N.A.
  • DUV (248 nm) exposure wavelength
  • Programmable annular illumination modes
  • 21 x 21 mm field size

Additional Resources:

Equipment Information Sheet


175nm l/s in UV82

200nm l/s in UV82

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Photolithography Training Sessions for the Week of March 19th
Mar 19, 2018
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Tuesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web pages ...more


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