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CNF Lab and Equipment Information
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ASML 300C DUV Stepper


ASML PAS 5500/300C DUV Stepper

ASML PAS 5500/300C Stepper Backup: John Treichler
Equipment Training
Training currently consists of working one-on-one with users on their project. Contact the staff to arrange a project.


This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with a variable field size up to 21mm square. Minimum feature size is <0.20µm. The number and placement of the dies is programmable. Wafer size of 3" up to 200mm can be accommodated, as well as smaller pieces. Registered alignment is typically <0.045µm. 6" x 0.250"-thick quartz masks are used.


  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.63 - 0.40 Variable N.A.
  • DUV (248 nm) exposure wavelength
  • Programmable annular illumination modes
  • 21 x 21 mm field size

Additional Resources:

Equipment Information Sheet


175nm l/s in UV82

200nm l/s in UV82

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