CNF - Lab and Equipment Information - GCA-6300 10X i-line Stepper

ASML PAS 5500/300C 248nm DUV Wafer Stepper

ASML DUV Stepper

Manager: Garry J. Bordonaro

Backup: John Treichler , Rob Ilic

Description:

This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with a variable field size up to 21mm square. Minimum feature size is <0.18µm. The number and placement of the dies is programmable. Wafer size of 3" up to 200mm can be accommodated, as well as smaller pieces. Registered alignment is typically <0.045µm. 6" x 0.250"-thick quartz masks are used.

Capabilities:

Step and repeat exposure system with laser-controlled stage motion
Zeiss lens with 0.63 - 0.40 Variable N.A.
DUV (248 nm) exposure wavelength
Programmable annular illumination modes
21 x 21 mm field size
Resolution to 0.15 µm
Overlay <0.045 µm

Additional Resources:

Alignment Mark GDS File
Fiducial Mark GDS File
GCA Stepper Operation Notes
10X Resist Matrix

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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