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CNF Lab and Equipment Information
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Aura 1000 Resist Strip

CAC Name: AURA1000

Gasonics downstream asher for dry stripping of photoresist

GaSonics Aura 1000 Backup: Meredith Metzler
Equipment Training
Please contact the tool manager to schedule training.

Description:

The Gasonics Aura 1000 utilizes a microwave source to create a stream of reactive oxygen for dry stripping of photoresist downstream from the microwave source. A heat lamp is used to raise the wafer temperature during the stripping process. The tool is setup for cassette to cassette processing of 4-inch wafers. Contact staff for information regarding other wafer sizes.

Capabilities:

  • No exposure of wafers to Ions...No Ion Damage.
  • Fully automated.
  • Robotic Cassette to Cassette wafer handling.
  • Typical one to two minute per wafer Processing.
  • Capable of up to 4 micron per minute removal for soft baked resist.


Additional Resources:

Equipment Information Sheet


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New AJA Ion Mill arriving - Veeco Ion Mill Going Away
Jan 15, 2014
1/15/14
CNF purchased a new fully automated, AJA ion mill with a 22cm Kaufman source. We will receive the system at the end of January/beginning of February time frame. Upon arrival we will install the system. This requires the removal of the existing Veeco ion mill. Consequently we will have a downtime of about a month or two without ion milling capabilities.
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