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CNF Lab and Equipment Information
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Aura 1000 Resist Strip

CAC Name: AURA1000

Gasonics downstream asher for dry stripping of photoresist

GaSonics Aura 1000 Backup: Meredith Metzler
Equipment Training
Please contact the tool manager to schedule training.


The Gasonics Aura 1000 utilizes a microwave source to create a stream of reactive oxygen for dry stripping of photoresist downstream from the microwave source. A heat lamp is used to raise the wafer temperature during the stripping process. The tool is setup for cassette to cassette processing of 4-inch wafers. Contact staff for information regarding other wafer sizes.


  • No exposure of wafers to Ions...No Ion Damage.
  • Fully automated.
  • Robotic Cassette to Cassette wafer handling.
  • Typical one to two minute per wafer Processing.
  • Capable of up to 4 micron per minute removal for soft baked resist.

Additional Resources:

Equipment Information Sheet

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AJA Ion Mill Shut down dates.
Nov 26, 2014
The AJA Ion Mill will be shut down at 8:00 AM Monday December 22 so that the Grids can be sent to their manufacturer for Inspection and testing. It is expected that the grids will be returned, and the Ion Mill back up by some time Thursday January 8.


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