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CNF Lab and Equipment Information
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Branson Resist Strip
CAC Name: BRANSON Oxygen plasma barrel asher for Photoresist/organic removal 
Manager: Jerry Drumheller
Backup: Meredith Metzler
Description:The Branson P2000 barrel etcher can automatically preheat, etch, and strip up to 50 wafers at a time. The etcher has capabilities for resist stripping, and resist pattern descumming; Additional Resources:Equipment Information SheetBack to Top |
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Oxford 100 unavailable 6/17-6/21
Jun 14, 2013 Oxford process support will be here from 6/17-6/21 and the tool will not be available during this time. 
ETCHING
Acid Etching Tanks Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Trion Etcher Unaxis 770 Deep Si Etcher Veeco Ion Mill Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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