Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


5X g-line Stepper

GCA 6300 DSW Projection Mask Aligner, 5X g-line Stepper

GCA-6300 5X g-line Stepper Backup: Edward Camacho , Michael Skvarla

Description:

This projection printer uses a g-line (436nm) lens column ( 0.30 N.A.) to provide a 5:1 reduction with a variable field size up to 15mm square. Minimum feature size is <0.9µm. The number and placement of the dies is programmable. Wafer size of 3" up to 150mm can be accommodated, as well as smaller pieces. A customized hand-held chuck system allows rapid change of substrate size. Registered alignment is typically <0.25µm. 5" x 0.090"-thick masks are used. This instrument can be easily converted to function as a GCA 3696 Photorepeater system for exposing photoresist coated glass plates up to 7".


Service schedule for the GCA tools is posted at: http://www.cnf.cornell.edu/cnf_maintenancecalendar.html

Capabilities:

  • Step and repeat exposure system with laser-controlled stage motion
  • Zeiss lens with 0.30 numerical aperture
  • g-line (436 nm) exposure wavelength
  • 15mm field size
  • Resolution to 0.9 µm


Additional Resources:

Alignment Mark GDS File
Fiducial Mark GDS File
GCA Stepper Operation Notes
5X Resist Matrix


Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNINNSF