CNF Lab and Equipment Information
CAC Name: PECVD
Oxford 100 PECVD System
Manager: Tom PennellBackup: Phil Infante
Currently available are a high rate oxide (250nm/min) and a low stress silicon nitride.
Additional Resources:Equipment Information Sheet
Oxford PECVD Instructios updated.doc
Back to Top
THIN FILM DEPOSITION
AJA Sputter Deposition
Arradiance ALD Gemstar-6
CVC Sputter Deposition
OEM Aluminum Nitride Sputtering System
Oxford ALD FlexAL
PVD75 Sputter Deposition
SC4500 Even-Hour Evaporator
SC4500 Odd-Hour Evaporator
Back to Equipment List
This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact firstname.lastname@example.org for assistance.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: email@example.com
Powered by ITX