CNF Lab and Equipment Information
CAC Name: CHA
3 Hearth Thermal Evaporator for Metal Films
Manager: Aaron WindsorBackup: Christopher Alpha
The CHA Industries vacuum system is used for evaporating thin films by resistive heating. A cryopump enables base pressures of 10E-7 Torr range to be reached. The 2 kW power supply is used for thermal evaporation from three individually shuttered parallel sources which can be used for sequential thin films. Gold, silver, aluminum, nickel, chrome, copper and germanium are among the metals available for deposition. Films up to 500 nm can be deposited. This system is a rapid turn-around machine with a typical pump down time of 45 minutes.
Additional Resources:Equipment Information Sheet
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Oxford ALD unavailable Mar. 19-23
Mar 16, 2018
The Oxford ALD will have its annual maintenance service from Monday-Friday (3/19-3/23).
THIN FILM DEPOSITION
AJA Sputter Deposition
Arradiance ALD Gemstar-6
CVC Sputter Deposition
Oxford ALD FlexAL
PVD75 Sputter Deposition
SC4500 Even-Hour Evaporator
SC4500 Odd-Hour Evaporator
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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