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CNF Lab and Equipment Information
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Rudolph AutoEL IV Ellipsometers
Transparent Thin Film Measurement tool 
Manager: Michael Skvarla
Equipment Training
Training is usually offered weekly, and often at a time convenient to the needs of the new users for the week. Please contact the tool manager for the training schedule. Description:The AutoEl IV has automatic 3 wavelength operation and a scanning stage. Multiple wavelength operation gives this instrument more flexibility for meauring multiple film stacks. The scanning stage allows wafer uniformity to be measured. The system automatically calculates ellipsometric parameters, thickness, and index. Additional Resources:Equipment Information SheetBack to Top |
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METROLOGY
Alpha Step 200 CDE ResMap Resistivity 4-pt Probe FilMetrics Film Measurement Systems FleXus Film Stress Measurement Leitz Film Measurement P10 Profilometer Soft Materials 4-point Probe VCA Optima Contact Angle Woollam Spectroscopic Ellipsometer Zygo Optical Profilometer Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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