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Leitz Film Measurement

Leitz Film Thickness Measurement System

Leitz Film Thickness Measurement System
Manager: Phil Infante
Equipment Training
Training is scheduled by need, please email requests for training to the tool manager.
There are no training sessions currently scheduled.


The Leitz MV-SP Spectrophotometer uses optical methods to obtain quick, non-destructive thickness measurements of films from 10 nm to 15 µm thick. Measurement time is from 20 to 60 seconds and accuracy is quoted as plus-minus 3%. Measurements can be done inside geometries as small as four square micrometers (4 µm by 1 µm). Software is provided for measuring silicon dioxide, silicon nitride, polysilicon, polyimide, aluminum oxide, and photoresist. These films may be measured on silicon, aluminum, or III-V substrates. Programs are also provided for measuring the top layer of multiple film structures. In addition, other films and substrates can be added to the Leitz's library.

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