CNF - Lab and Equipment Information

CNF Lab and Equipment Information

Schedule Training ¦

EV620 Contact Aligner

CAC Name: EV620

Contact Lithography Exposure Tool

Manager: Christopher Alpha

Backup: Edward Camacho

Equipment Training
Training for the EV620 is offered every couple of weeks. The training covers full tool operation and takes 2 hours. If you have a specific need for training, email the tool manager to request a training session.

There are no training sessions currently scheduled.

Description:

The EV620 contact aligner can be used for front side or back side alignment of 3, 4, and 6 inch wafers. It can do both contact and proximity printing as well as flood exposure of the wafers.

A UV filter is also available to block wavelengths below 350nm. This can improve the imaging of SU-8 and KMPR resists from Microchem.

Additional Resources:

Equipment Information Sheet
Contact Lithography Alignment Keys
EV620 User Manual

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AUTOSTEP AS200 *UNAVAILABLE* June 3rd-7th
May 24, 2013
The AS200 will be undergo regular maintenance beginning June 3rd and continuing the rest of the week. Any changes to the schedule will be posted here.

Please plan accordingly.

Garry

Notice Archive

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu