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Suss MJB4 Contact Aligner

CAC Name: MJB4

Suss MicroTech MJB4 Contact Lithography Exposure Tool

EV620 contact aligner Backup: Christopher Alpha , Garry Bordonaro
Equipment Training
Training is offered weekly on a per need basis specially when there are new users. Please check the Training Schedule or contact the tool manager. Make sure before you request contact aligner training you have completed "General Lithography Training", since it is a prerequisite.
There are no training sessions currently scheduled.


The MJB4 contact aligner can be used for Topside Alignment and Backside Infrared Alignment on substrate sizes ranging 5mm square to 100mm in diameter. It is capable of printing .5um lines and spaces with a light source of wavelength range between 350 and 450nm. This light source is controlled by constant intensity power supply. This contact aligner has 5 exposure modes; Soft Contact, Hard Contact, Vacuum Contact, Soft Vacuum Contact and Gap Exposure. Alignment travel range for X and Y is +/- 5mm and 5 degrees for theta.


  • Topside and backside alignment
  • Topside and backside alignment
  • Wavelength from 350nm - 450nm
  • Minimum 0.5um line/space

Additional Resources:

Equipment Information Sheet
Contact Lithography Alignment Keys
Contact Aligner Resist Matrix

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Photolithography Training Sessions for the Week of March 19th
Mar 19, 2018
General Photolithography training will be offered Tuesday at 1:30PM. We will meet in the Spinner room.

Heidelberg DWL2000 Mask Writer Training will be offered Tuesday at 3:30PM. Meet at the tool.

AB-M contact aligner, Schott IR inspection tool, MA6 contact aligner, and Wafer Bonder training can be scheduled with Edward Camacho.


For any other training sessions, this week contact the tool owner for scheduling. Please review the materials available at each of the web pages ...more


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