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PHOTOLITHOGRAPHY
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EV620 Contact Aligner
CAC Name: EV620 Contact Lithography Exposure Tool 
Manager: Christopher Alpha
Backup: Edward Camacho
Equipment Training
Training for the EV620 is offered every couple of weeks. The training covers full tool operation and takes 2 hours. If you have a specific need for training, email the tool manager to request a training session.
There are no training sessions currently scheduled.
Description:The EV620 contact aligner can be used for front side or back side alignment of 3, 4, and 6 inch wafers. It can do both contact and proximity printing as well as flood exposure of the wafers. Additional Resources:Equipment Information SheetContact Lithography Alignment Keys EV620 User Manual Back to Top |
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PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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