Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User

Suss MJB4 Contact Aligner

Suss MicroTech MJB4 Contact Lithography Exposure Tool

EV620 contact aligner Backup: Christopher Alpha , Garry Bordonaro


The MJB4 contact aligner can be used for Topside Alignment and Backside Infrared Alignment on substrate sizes ranging 5mm square to 100mm in diameter. It is capable of printing .5um lines and spaces with a light source of wavelength range between 350 and 450nm. This light source is controlled by constant intensity power supply. This contact aligner has 5 exposure modes; Soft Contact, Hard Contact, Vacuum Contact, Soft Vacuum Contact and Gap Exposure. Alignment travel range for X and Y is +/- 5mm and 5 degrees for theta.


  • Topside and backside alignment
  • Topside and backside alignment
  • Wavelength from 350nm - 450nm
  • Minimum 0.5um line/space

Additional Resources:

Contact Lithography Alignment Keys
Contact Aligner Resist Matrix

Back to Top

Button: Search Button: Search Keywords
Cornell University