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Suss MJB4 Contact Aligner
Suss MicroTech MJB4 Contact Lithography Exposure Tool ![]() Manager: Edward Camacho
Backup: Christopher Alpha
, Garry Bordonaro
Description:The MJB4 contact aligner can be used for Topside Alignment and Backside Infrared Alignment on substrate sizes ranging 5mm square to 100mm in diameter. It is capable of printing .5um lines and spaces with a light source of wavelength range between 350 and 450nm. This light source is controlled by constant intensity power supply. This contact aligner has 5 exposure modes; Soft Contact, Hard Contact, Vacuum Contact, Soft Vacuum Contact and Gap Exposure. Alignment travel range for X and Y is +/- 5mm and 5 degrees for theta. Capabilities:
Additional Resources:Contact Lithography Alignment KeysContact Aligner Resist Matrix Back to Top |
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![]() This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |