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EV620 Contact Aligner

Contact Lithography Exposure Tool

EV620 contact aligner
Manager: Christopher Alpha
Backup: Edward Camacho

Description:

The EV620 contact aligner can be used for front side or back side alignment of 3, 4, and 6 inch wafers. It can do both contact and proximity printing as well as flood exposure of the wafers.

A UV filter is also available to block wavelengths below 350nm. This can improve the imaging of SU-8 and KMPR resists from Microchem.


Additional Resources:

Contact Lithography Alignment Keys
EV620 User Manual


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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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