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CNF Lab and Equipment Information
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E-Beam Lithography Hotplates

Hot plates for baking electron beam lithography resist

Backup: Amrita Banerjee , Alan R. Bleier
Equipment Training
Please go through the general photolithography training before using these hot plates.


Hot plates for use in baking resist for ebeam lithography


  • 1 hot plate at 170°C strictly for baking PMMA
  • 1 general use vacuum oven up to 120°C
  • 4 general use hot plates for ebeam lithography up to 225°C

Additional Resources:

Equipment Information Sheet

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