ComputingCleanroom and Equipment StatusCoral - XReporter
Button: Equipment ListButton: MSDS DatabaseButton: Policies & FormsButton: Education & TrainingButton: StaffButton: Events & Seminars Button: Publication Button: About CNF Button: Lab Manual

CNF Lab and Equipment Information
Report Trouble   ¦    View Open Trouble   ¦    Schedule Training   ¦



E-Beam Lithography Hotplates

Hot plates for baking electron beam lithography resist

Backup: Amrita Banerjee , Alan R. Bleier
Equipment Training
Please go through the general photolithography training before using these hot plates.

Description:

Hot plates for use in baking resist for ebeam lithography

Capabilities:

  • 1 hot plate at 170°C strictly for baking PMMA
  • 1 general use vacuum oven up to 120°C
  • 4 general use hot plates for ebeam lithography up to 225°C


Additional Resources:

Equipment Information Sheet


Back to Top


EQUIPMENT LIST


Button: Search Button: Search Keywords
Cornell University
NYSTARNNCINSF