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CNF Lab and Equipment Information
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Brewer Science 300 mm Spinner

CAC Name: 300mm Spinner

Backup: Amrita Banerjee
Equipment Training
Equipment Training: Please contact tool managers by email to make a training appointment if you have not already used the e beam lithography spinners, which use the same software.


General use manual spinner for large substrates.


Spinner for applying resist on 300 mm wafers, and also on photomasks and large glass plates, such as substrates for displays.

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