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Brewer Science 300 mm Spinner

CAC Name: 300mm Spinner

Backup: Amrita Banerjee
Equipment Training
Equipment Training: Please contact tool managers by email to make a training appointment if you have not already used the e beam lithography spinners, which use the same software.

Description:

General use manual spinner for large substrates.

Capabilities:

Spinner for applying resist on 300 mm wafers, and also on photomasks and large glass plates, such as substrates for displays.




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