Anatech Resist Strip
Anatech Plasma Asher
Manager: Jerry DrumhellerBackup: Christopher Alpha , Daniel McCollister
The Anatech USA, model SCE-110-RF, Oxygen plasma Asher is a 10 inch diameter all quartz barrel asher. It is ICP powered 13.56 MHz up to 1000 Watts. It is equipped for both oxygen and nitrogen plasma.
The touch screen controller is configured to run up to 3 step processes, and the first step can be programmed to terminate at a temperature set point on a chamber probe.
Typically wafer descum after developing resist, and stripping resist after an etch.
Back to Top
This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact firstname.lastname@example.org for assistance.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: email@example.com
Powered by ITX