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ETCHING
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Anatech Resist Strip
CAC Name: Anatech Resist Strip Anatech Plasma Asher 
Manager: Jerry Drumheller
Backup: Christopher Alpha
, Daniel McCollister
Equipment Training
Training is "as needed", and set up through email. Description:The Anatech USA, model SCE-110-RF, Oxygen plasma Asher is a 10 inch diameter all quartz barrel asher. It is ICP powered 13.56 MHz up to 1000 Watts. It is equipped for both oxygen and nitrogen plasma. Capabilities:The touch screen controller is configured to run up to 3 step processes, and the first step can be programmed to terminate at a temperature set point on a chamber probe. Processes Available:Applications:Typically wafer descum after developing resist, and stripping resist after an etch. Additional Resources:Equipment Information SheetBack to Top |
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ETCHING
Acid Etching Tanks AJA Ion Mill Anatech Resist Strip Aura 1000 Resist Strip Branson Resist Strip Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Hot SC1/SC2 KOH Etching Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher Oxford Cobra ICP Etcher PlasmaTherm Deep Si Etcher Primaxx Vapor HF Etcher PT72 Etcher PT720-740 Etcher PT770 Etcher Samco-UV-Ozone Trion Etcher Unaxis 770 Deep Si Etcher Xactix Xenon Difluoride Etcher YES Asher Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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