AJA Ion Mill
Manager: Jerry DrumhellerBackup: Tom Pennell
The AJA Ion Mill is a 22cm diameter Kaufman RF-ICP gridded ion source producing a collimated Argon ion beam which provides uniform etching of samples up to 6 inch diameter. The sample holder is water cooled at 20 degrees C. and has motorized tilt (0-180 degrees), and continuous sample rotation up to 25 RPM. The system is Cryo Pumped with a base pressure in the 10-8 torr range.
Etching a wide range of Materials at rates which are related to their sputter yield. The wafer tilt and rotation feature is typically used to control the etch wall angle.
The system is set with 4 different beam energies: 400V, 600V, 800V, and 1000V.
Ion milling is often very useful for etching of materials which are difficult to RIE. Magnetic,Super conducting, Metal Oxides, Metal Nitrides, Piezoelectric, Noble Metals ( Au, Pd etc).
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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