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CNF Litho Resources
Manager: John TreichlerBackup: Alan R. Bleier
Java based CNF lithography resource was designed to help CNF users attain ultimate control of vertices when dealing with curved geometries. This resource will not replace a CAD package, but will help export GDS files with generated features which could then be imported and laid out within a CAD package. Arrays of circles, ellipses, tori, concentric rings (bulls eye patterns), spirals are amongst some of the elements provided within the package. Furthermore, the resource provides standard and custom lithographic alignment marks, job and schedule file generation with array layout viewing (similar to ACHK) along with dose generation (dose and base dose with ability to import dose tables) for the JEOL9300 and JEOL6300 electron beam lithography tools, JEOL alignment offset calculator, a text generation resource with resolution control, custom label generator for individual die, arbitrary function generator, modulated pillar/hole arrays, photonic crystals, zone plates, are several additional resources within the package.
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AutoCAD Pattern Data
CATS Pattern Conversion and Proximity Correction Suite
File Transfer Share for Tools
GenISys Layout BEAMER - E-beam Pattern Conversion and Proximity Correction
GenISys Layout LAB
Intel Computing Cluster
L-Edit CAD Software
LinkCAD pattern preparation software
Mobile CNFUsers Site
PROLITH by KLA-Tencor
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This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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