CNF Lab and Equipment Information
CAC Name: JEOL 9500
JEOL JBX9500FS Electron Beam Lithography System
Manager: Alan R. BleierBackup: Amrita Banerjee , John Treichler
The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.
Additional Resources:Equipment Information Sheet
Shot pitch and write time estimation spreadsheet
JEOL Alignment Mark Requirements
Location of tool in cleanroom (jpg)
Offset calculator for aligned exposures
Back to Top
E-Beam Lithography Hotplates
E-Beam Lithography Resist Spinners
General Electron Beam Lithography Training
Back to Equipment List
This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
If you have a disability and are having trouble accessing information on this website or need materials in an alternate format, contact email@example.com for assistance.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: firstname.lastname@example.org
Powered by ITX