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JEOL 9500

CAC Name: JEOL 9500

JEOL JBX9500FS Electron Beam Lithography System

Backup: Amrita Banerjee , John Treichler
Equipment Training
This training covers operation of the JEOL 9500, after a user has done the general electron beam lithography training. JEOL 6300 training is separate. Please sign up online at least one day in advance on the CNF users face to face training page http://www2.cnfusers.cornell.edu/facetoface.php . Training will take place only if someone has signed up online at least one day in advance.

Description:

The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.

The tool is capable of loading samples from 10 mm up to 300 mm and writing features as small as 6 nm or less. The clock speed has been increased to 100 MHz, reducing write times. Stitching and overlay specifications have also been in improved dramatically over the previous generation.

Capabilities:

  • Accelerating Voltage: 100 kV
  • Field Size: 1 mm
  • Writing Speed: 100 MHz
  • Sample Size: Small pieces to 300 mm wafers
  • Minumum beam diameter: 3.2 nm
  • Minimum Feature Size: 6 nm
  • Maximum beam current: 100 nA


Additional Resources:

Equipment Information Sheet
Shot pitch and write time estimation spreadsheet
JEOL Alignment Mark Requirements
Location of tool in cleanroom (jpg)
Offset calculator for aligned exposures


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