JEOL JBX9500FS Electron Beam Lithography System
Manager: Alan R. BleierBackup: Amrita Banerjee , John Treichler
The JEOL 9500 is the next generation direct write ebeam lithography system from JEOL. Currently it is the only system in the US and only the 3rd in the world. The CNF tool is the first 9500 with improved column optics for a reduced spot size, making it unique among the systems currently in operation.
Additional Resources:Shot pitch and write time estimation spreadsheet
JEOL Alignment Mark Requirements
Location of tool in cleanroom (jpg)
Offset calculator for aligned exposures
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This material is based upon work supported by the National Science Foundation under Grant No. NNCI-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
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