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PHOTOLITHOGRAPHY
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SU-8 Hotplates
CAC Name: SU-8 hotplates 1-4 Hotplates for baking SU-8-coated wafers
Manager: Beth Rhoades
Backup: Edward Camacho
, Garry Bordonaro
Equipment Training
Training for first time use of the room is required.Contact Beth. Please adhere to the instructions on the Equipment Information Sheet. Description:9 hotplates are available for baking SU-8-coated substrates in the SU-8 lithography area (clean room 106). Capabilities:Processes Available:Hotplates have been grouped and labeled to accommodate both users with long and short bake processes Applications:Additional Resources:Equipment Information SheetBack to Top |
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PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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