Button: Contact CNFButton: MultimediaButton: About CNF
Button: Getting StartedButton: PublicationButton: REU ProgramButton: Events & SeminarsButton: Education OutreachButton: TechnologiesButton: Lab Equipment

Button: Lab User


General Material Anneal 1 - A1

MRL Industries Furnace for nitrogen anneals or oxidation of nonelectronic substrates

Anneal Tube
Manager: Phil Infante

Description:

The Anneal 1 Furnace is an atmospheric furnace with a 42” flat zone capable of processing up to 6” diameter wafers. The furnace tube is equipped with N2 gas for inert ambient processing, H2 for forming gas mixtures with N2, and O2 for dry oxidation with or without HCL. Most sample materials are accommodated.

Capabilities:

  • N2 and H2/N2 Anneals up to 5% H2 max
  • Dry Oxidation
  • HCL during oxidations up to a 4% level
  • Pieces to 6” diameter wafers can be processed
  • Maximum temperature of 1100 °C




Back to Top




Button: Search Button: Search Keywords
Cornell University
NYSTARNNINNSF

This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
Powered by ITX