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CNF Lab and Equipment Information
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Heidelberg Mask Writer DWL2000
CAC Name: DWL 2000 DWL2000 Laser Pattern Generator and Direct Writer
Manager: Rob Ilic
Backup: John Treichler
Equipment Training
Training is scheduled by need, please email requests for training to the tool manager. Once a need has been established registration for training sessions will be performed over the web. Training classes are limited to 3 users. Description:The Heidelberg Instruments DWL 2000 is an economical, high resolution direct write pattern generator for direct writing on photosensitive Cr mask plates. The tool can handle mask sizes from 3 to 9 inches. The unit has an interchangeable write head that can accommodate different feature sizes for writing. The smallest feature size is 0.7 microns and 0.6 microns with the 4mm and 2mm write heads, respectively. Capabilities:
Additional Resources:Equipment Information SheetBack to Top |
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Photolithograhy Training Sessions for the Week of June 17th
Jun 18, 2013 General Photolithography training will be held Tuesday at 1:30 PM. Meet in the Spinner Room. MA6 Mask Aligner training session will be held Wednesday at 10:00AM. Meet in the Contact Aligner Room. ABM Mask Aligner training session will be held Thursday at 10:00AM. Meet in the Contact Aligner Room. PG training will be scheduled based on requests. Please review the materials available at each of the web pages associated with the tools above. PLEASE BE ON TIME! __________ Edwar ...more
SPACE AVAILABLE in Microfluidics Course
Jun 18, 2013 The NBTC is offering a 3-day course covering the design, fab, and assembly of microfluidic devices. The course is offered June 26-28. Contact Teresa Porri if interested. Only a few slots left! 254-5200. ![]()
PHOTOLITHOGRAPHY
5X g-line Stepper ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper EV620 Contact Aligner Fusion UV Cure Gamma Automatic Coat-Develop Tool Hamatech-Steag Mask Processors Hamatech-Steag Wafer Processors Heidelberg Mask Writer DWL2000 JBA 1000 Photoresist UV Cure Karl Suss RC-8 Manual Resist Spinners Nanoimprint NX-2500 PG Mask Writer Resist Hot Strip Bath SU-8 Hotplates Suss MA6-BA6 Contact Aligner YES Image Reversal Oven YES Polymide Bake Oven YES Vapor Prime Oven Back to Equipment List |
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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. Cornell NanoScale Science & Technology Facility (CNF) 250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700 Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu Powered by ITX |
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