CNF - Lab and Equipment Information

CNF Lab and Equipment Information

Schedule Training ¦

Heidelberg Mask Writer DWL2000

CAC Name: DWL 2000

DWL2000 Laser Pattern Generator and Direct Writer

Manager: Rob Ilic

Backup: John Treichler

Equipment Training
Training is scheduled by need, please email requests for training to the tool manager. Once a need has been established registration for training sessions will be performed over the web. Training classes are limited to 3 users.

Description:

The Heidelberg Instruments DWL 2000 is an economical, high resolution direct write pattern generator for direct writing on photosensitive Cr mask plates. The tool can handle mask sizes from 3 to 9 inches. The unit has an interchangeable write head that can accommodate different feature sizes for writing. The smallest feature size is 0.7 microns and 0.6 microns with the 4mm and 2mm write heads, respectively.

DWL 2000 system consists of the main system unit, an XP-based PC for running job files, a Linux based PC for data conversion and a pattern generator (located in the service chase). The tool accepts files of various format, for best results use the semiconductor standard GDSII format.

Capabilities:

Write Lens 4mm - 0.7um nominal resolution at 110mm^2/min
Write Lens 2mm - 0,6um nominal resolution at 29mm^2/min
Direct write on masks 3 to 9 inches in extent
GDSII pattern files only

Additional Resources:

Equipment Information Sheet

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu