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Carbon Nanotube/Graphene Furnace

CAC Name: CNTGraphene

First Nano Carbon Nanotube and Graphene Furnace

FIRST NANO Furnace
Manager: Phil Infante
Backup: Noah Clay
Equipment Training
Please contact Phil Infante to set up a tool training session. Trainings are scheduled on a case by case basis.

Description:

Capabilities:

  • Carbon Nanotube Growth
  • Graphene Growth
  • Hydrogen Annealing up to 1000 C
  • Vacuum Annealing up to 1000 C
  • Samples up to 100mm diameter


Additional Resources:

Equipment Information Sheet


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Notice Archive

EQUIPMENT LIST
FURNACE PROCESSING

Boron Doping - D1
Carbon Nanotube/Graphene Furnace
CMOS N+ Polysilicon - D3
CMOS Wet Oxide - E2
General Material Anneal 1 - A1
LPCVD CMOS Nitride - E4
LPCVD LTO - B3
LPCVD Nitride - B4
MOS Clean
MOS Clean Anneal 2 - B1
MOS Metal Anneal 3 - C1
MOS Metal Anneal 4 - C2
N+/P+ Polysilicon - C4
Phosphorus Doping - D2
TFT LPCVD LTO410 - A3
TFT Polysilicon - A4
TFT Wet/Dry Oxide - A2
Wet/Dry Oxide - B2

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This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: information@cnf.cornell.edu
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