JEOL JBX-6300FS 100 kV Electron Beam Lithography System
Manager: Alan R. BleierBackup: Amrita Banerjee , John Treichler
The unique capability of the JEOL 6300 is that a fifth lens can be used to get a smaller beam spot size and write sub-10 nm features. This is the high resolution writing mode. Writing without the 5th lens in 4th lens mode is called the high speed writing mode.
Additional Resources:Shot pitch and write time estimation spreadsheet
JEOL Alignment Mark Requirements
Offset calculator for aligned exposures
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This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
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