Hamatech Hot SC1/SC2
Automatic Single Wafer Processor for SC-1 & SC-2 cleans
Manager: Edward CamachoBackup: Garry Bordonaro
This Hamatech is a wafer processor is capable of doing a SC-1 (Ammonium Hydroxide and Hydrogen Peroxide) clean and SC-2 (Hydrochloric Acid and Hydrogen Peroxode) on photomasks (4, 5, & 7 inch) and wafers (3, 4, and 6 inch). The DI water gets heated and then it is combined with the process chemistry.
Organic Clean (SC1) and Ionic Clean (SC2)
Wafer Bonding and Nanoimprint
Back to Top
This material is based upon work supported by the National Science Foundation under Grant No. ECS-0335765. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Cornell NanoScale Science & Technology Facility (CNF)
250 Duffield Hall, Cornell University, Ithaca, New York 14853-2700
Voice: 607-255-2329, Fax: 607-255-8601, Email: firstname.lastname@example.org
Powered by ITX